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DRAFT   

a research group of the department of Solid State Sciences, Ghent University


RSD2013 - Reactive Sputter Depostion

This software models the reactive sputtering process of a single sputtering target in (pulsed) DC mode with one reactive gas added.  The used model is based on the previous models RSD2007 [Journal of Physics : Applied Physics D, 40 (2007) 1957–1965] and RSD2009 [Journal of Applied Physics, 107 (2010) 113307] by Diederik Depla. In the RSD2013 software two solution methods are available: a time dependent and a steady state solution. Both target and substrate can be described in a spatial and/or time resolved way by defining appropriate deposition (SIMTRA) and current profiles. The substrate condition is described in a similar way as by the original model developed by S. Berg [Thin Solid Films 476 (2005) 215]. However, to describe the target poisoning more reaction paths are taken into account. The first path is the same as in the Berg model, i.e. chemisorption of reactive gas molecules on the target. A second path is the implantation of reactive ions, formed in the plasma, in the target. Finally, as last path, the chemisorbed species can be knock-on implanted into the target. These implanted reactive species react with the target material. The effect of redeposition, the deposition of sputtered material back on the target, is also accounted for.

The software has been developed by Koen Strijckmans and the latest public version is 3. Feel free to report any bugs.
When using this software, please refer:

A time-dependent model for reactive sputter deposition
K Strijckmans and D Depla
Journal of Physics D: Applied Physics (2014) 47 235302

Download for free a trial version (no registration required) or
one of the unlimited versions (small registration required):

Download RSD2013v3 (14-day trial version)

Download other RSD2013 versions (unlimited)

RSD2013v3 manual


SiMTra - Simulation of the Metal Transport

SiMTra is a binary collision Monte Carlo program that allows the user to simulate the transport of sputtered particles through the gas phase flux during sputtering. The user is able to define the simulated configuration, and thus to mimic his own experimental setup. Not only the deposition profile and rate but also the properties of the metallic flux (energy, direction,...) are an output of the code.

The code has been orginally developed by Koen Van Aeken, where the new graphical interface has been constructed by Francis Boydens.
Suggestions for improvement were made by the team (active in the period of 31/08 to 30/09/2015).

The latest version is 2.2 Feel free to report any bugs.

When using this software, please refer:

The metal flux from a rotating cylindrical magnetron : a Monte Carlo simulation
K. Van Aeken, S. Mahieu, D. Depla
Journal of Physics D.: Applied Physics 41 (2008) 20530

For some examples on the use of SiMTra, see:

Magnetron sputter deposition as visualized by Monte Carlo modeling
D. Depla, W.P. Leroy
Thin Solid films 520 (2012) 6337

Download for free a trial version (no registration required) or
one of the unlimited versions (small registration required):

Download SiMTrav2.2 (14-day trial version)

Download other SiMTra versions (unlimited)

Download SiMTra v2.1.1 manual



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