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DRAFT   

a research group of the department of Solid State Sciences, Ghent University


A1 publications:  (from 1997 till now)


2018

  1. The effect of energy and momentum transfer during magnetron sputter deposition of yttrium oxide thin films
    J. Xia, W. Liang, Q. Miao, D. Depla
    Applied Surface Science 439 (2018) 545–551 doi:10.1016/j.apsusc.2017.12.205
  2. Anomalous effects in the aluminum oxide sputtering yield
    R. Schelfhout, K. Strijckmans, D. Depla
    J. Phys. D: Appl. Phys. 51 (2018) 155202 (9pp)  doi:10.1088/1361-6463/aab321
  3. Impurity dominated thin film growth
    F. Cougnon, A. Dulmaa, R. Dedoncker, R. Galbadrakh, D. Depla
    Appl. Phys. Lett. 112 (2018) 221903 doi: 10.1063/1.5021528
  4. Reactive sputter deposition of CoCrCuFeNi in nitrogen/argon mixtures
    R.Dedoncker, Ph.Djemia,G.Radnóczi,F.Tétard,L.Belliard,G.Abadias,N.Martin,D.Depla
    Journal of Alloys and Compounds 769 (2018) 881-888 doi: 10.1016/j.jallcom.2018.08.044
  5. An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering
    R. Schelfhout, K. Strijckmans, D. Depla
    Surface & Coatings Technology 253 (2018) 231-236 doi: 10.1016/j.surfcoat.2018.09.002

2017

  1. The target material influence on the current pulse during high power pulsed magnetron sputtering
    F. Moens, S. Konstantinidis, D. Depla
    Frontiers in Physics 5 (2017) 51 doi:10.3389/fphy.2017.00051

  2. Structural evolution and growth mechanisms of RF-magnetron sputter-deposited hydroxyapatite thin films on the basis of unified principles
    A.A. Ivanovaa,M.A. Surmeneva, R.A. Surmenev, D. Depla
    Applied Surface Science 425 (2017) 497-506 doi:10.1016/j.apsusc.2017.07.039

  3. The nanostructure and mechanical properties of nanocomposite Nbx-CoCrCuFeNi thin films
    B.R. Braeckman, F. Misják, G. Radnóczi, M. Caplovicová, Ph. Djemia, F. Tétard, L. Belliard, D. Depla
    Scripta Materialia 139 (2017) 155–158 doi:10.1016/j.scriptamat.2017.06.046

  4. Impurity controlled growth and elastic properties of CoCrCuFeNi thin films
    B. R. Braeckman, Ph. Djemia, F. Tétard, L. Belliard, D. Depla
    Surface & Coatings Techology 315 (2017) 475–483, doi:10.1016/j.surfcoat.2017.03.014

  5. Effect of space charge on the negative oxygen flux during reactive sputtering
    F. Moens, T. Kalvas, S. Van Steenberge, D. Depla
    J. Phys. D: Appl. Phys. 50 (2017) 115201 (8pp), doi:10.1088/1361-6463/aa5ab6
     
  6. Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?
    K. Strijckmans, F. Moens, D. Depla
    J. Appl. Phys. 121 (2017) 080901, doi:10.1063/1.4976717
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2016

  1. The influence of Ge and In addition on the phase formation of CoCrCuFeNi high-entropy alloy thin films
    B.R. Braeckman, F. Misják, G. Radnóczi, D. Depla
    Thin Solid Films 616 (2016) 703–710 doi:10.1016/j.tsf.2016.09.021

  2. The existence of a double S-shaped process curve during reactive magnetron sputtering
    R. Schelfhout, K. Strijckmans, D. Depla
    Applied Physics Letters 109 (2016) 111605, doi:10.1063/1.4962958

  3. Hysteresis behavior during facing target magnetron sputtering
    F.G. Cougnon, K. Strijckmans, R. Schelfhout, D. Depla
    Surface & Coatings Technology 294 (2016) 215-219, doi:10.1016/j.surfcoat.2016.03.096

  4. Sputter deposition of Ce(Sm,Y)O2 thin films : linking phase instability to grain size
    S. Van Steenberge, D. Depla
    J. Phys. D: Appl. Phys. 49 (2016) 245302 (11pp), doi:10.1088/0022-3727/49/24/245302

  5. Quantitative correlation between intrinsic stress and microstructure of thin films
    D. Depla, B. Braeckman
    Thin Solid Films, (2016) 90-93 doi:10.1016/j.tsf.2016.03.039

  6. The influence of the pressure on the microstructure of yttria-stabilized zirconia thin films deposited by dual magnetron sputtering
    D. Depla, A. Besnard, J. Lamas
    Vacuum 125 (2016) 118-122 , doi:10.1016/j.vacuum.2015.12.013

  7. Finite element modelling of the ionic conductivity of acceptor doped ceria
    D. Van Laethem, J. Deconinck, D. Depla, A. Hubin
    Journal of the European Ceramic Society 36 (2016) 1983-1994 , doi:10.1016/j.eurceramsoc.2016.02.025

  8. On the amorphous nature of sputtered thin film alloys
    B. Braeckman, D. Depla
    Acta Materialia 109 (2016) 323-329, doi:10.1016//j.actamat.2016.02.035
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2015

  1. Influence of deposition conditions on the composition, texture and microstructure of RF-magnetron sputter deposited hydroxyapatite thin films
    A. Ivanova, M. Surmeneva, R.A. Surmenev, D. Depla
    Thin Solid Films 591  (2015) 368-374, doi:10.1016/j.tsf.2015.03.058

  2. On the target surface cleanness during magnetron sputtering
    R. Schelfhout, K. Strijckmans, F. Boydens, D. Depla
    Applied Surface Science 355(2015)743-747, doi:10.1016/j.apsusc.2015.07.073

  3. Structure formation and properties of sputter deposited Nbx-CoCrCuFeNi high entropy alloy thin films
    B.R. Braeckman, D. Depla
    Journal of Alloys and Compounds 646 (2015) 810-815 doi:10.1016/j.jallcom.2015.06.097

  4. Study on reactive sputtering of yttrium oxide: Process and thin film properties
    P. Lei, W. Leroy, B. Dai, J. Zhu, J. Han, D. Depla
    Surface and Coatings Technology 276(2015) 39-46, doi:10.1016/j.surfcoat.2015.06.052

  5. High entropy alloy thin films deposited by magnetron sputtering of powder targets
    B.R. Braeckman, F. Boydens, H. Hidalgo, P. Dutheil, M. Jullien, A.-L. Thomann, D. Depla
    Thin Solid Films 2015 (580) 71-76, doi:10.1016/j.tsf.2015.02.070

  6. Hydrogenated Dimer Acid as a Corrosion Inhibitor for Lead Metal Substrates in Acetic Acid
    M. De Keersmaecker, O. Van Den Berg, K. Verbeken, D. Depla, A. Adriaens
    J. Electrochem. Soc. 162 (2015) C167-C179, doi: 10.1149/2.0461504jes 

  7. Modeling target erosion during reactive sputtering
    K. Strijckmans, D. Depla
    Applied Surface Science 133 (2015) 185-192, doi: 10.1149/2.0461504jes
  8. Bio-based nitriles via heterogeneously catalyzed oxidative decarboxylation of amino acids
    L. Claes, R. Matthessen, I. Rombouts, I. Stassen, T. De Baerdemaeker, D. Depla, J. A. Delcour, B. Lagrain, D. E. De Vos
    ChemSuSChem 8 (2015) 345-352, doi: 10.1002/cssc.201402801

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2014:

  1. The role of the erosion groove during reactive sputter deposition
    D. Depla, K. Strijckmans, R. De Gryse
    Surface and Coatings Technology 285 (2014) 1011-1015, doi: 10.1016/j.surfcoat.2014.07.038

  2. Momentum transfer driven textural changes of CeO2 thin films
    S. Van Steenberge, W.P. Leroy, A. Hubbin, D. Depla
    Applied Physics Letters 105 (2014) 111602, doi: 10.1063/1.4895785

  3. Base catalytic activity of alkaline earth MOFs: a(micro)spectroscopic study of active site formation by the controlled transformation of structural anions
    P. Valvekens, D. Jonckheere, T. De Baerdemaeker, A. V. Kubarev, M. Vandichel,K. Hemelsoet, M. Waroquier, V. Van Speybroeck, E. Smolders, D. Depla, M. B. J. Roeffaers and D. De Vos
    Accepted for publication in Chemical Science, doi:10.1039/c4sc01731e

  4. A time-dependent model for reactive sputter deposition
    K. Strijckmans and D. Depla
    Journal of Physics D: Applied Physics 47 (2014) 235302, doi:10.1088/0022-3727/47/23/235302

  5. On the effective sputter yield during magnetron sputter deposition
    D. Depla
    Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 328 (2014) 65, DOI 10.1016/j.nimb.2014.03.001

  6. Influence of the target–substrate distance on the growth of YSZ thin films
    J.S. Lamas, W.P. Leroy, D. Depla
    Surface and Coatings Technology 241 (2014) 26, DOI 10.1016/j.surfcoat.2013.10.018

  7. Electrochemical and Surface Study of Neutralized Dodecanoic Acid on a Lead Substrate
    M. De Keersmaecker, D. Depla, K. Verbeken, A. Adriaens
    Journal of The Electrochemical Society 161 (2014) C126, DOI 10.1149/2.071403jes

  8. Using the macroscopic scale to predict the nano-scale behavior of YSZ thin films
    J.S. Lamas, W.P. Leroy, Y.-G. Lu, J. Verbeeck, G. Van Tendeloo, D. Depla
    Surface and Coatings Technology 238 (2014) 45, DOI 10.1016/j.surfcoat.2013.10.034

  9. Influence of oxygen flow and film thickness on the texture and microstructure of sputtered ceria thin films
    S. Van Steenberge, W.P. Leroy, D. Depla
    Thin Solid Films 553 (2014) 2, DOI 10.1016/j.tsf.2013.11.049
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2013: 

    1. Influencing the hysteresis during reactive magnetron sputtering by gas separation
      D. Depla, J. Haemers, R. De Gryse
      Surface and Coatings Technology 235 (2013) 62, DOI 10.1016/j.surfcoat.2013.07.012

    2. A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination
      E. Särhammer, K. Strijckmans, T. Nyberg, S. Van Steenberge, S. Berg, D. Depla
      Surface and Coatings Technology 232 (2013) 357, DOI 10.1016/j.surfcoat.2013.05.035

    3. Reactive sputter deposition of Al doped TiOx thin films using titanium targets with aluminium inserts
      B.R. Braeckman, F. Boydens, D. Depla, D. Poelman
      Journal of Alloys and Compounds 578 (2013) 44, DOI 10.1016/j.jallcom.2013.05.011

    4. The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering
      F. Boydens, W.P. Leroy, R. Persoons, D. Depla
      Thin Solid Films 531 (2013) 32, DOI 10.1016/j.tsf.2012.11.097

    5. Influence of particle and energy flux on stress and texture development in magnetron sputtered TiN films
      G. Abadias, W.P. Leroy, S. Mahieu, D. Depla
      Journal of Physics D: Applied Physics 46 (2013) 055301, DOI 10.1088/0022-3727/46/5/055301


2012: 

  1. The fictional transition of the preferential orientation of yttria-stabilized zirconia thin films
    J.S. Lamas, W.P. Leroy, D. Depla
    Thin Solid Films 525 (2012) 6, DOI 10.1016/j.tsf.2012.10.061

  2. Synthesis, Crystal Structures, and Luminescence Properties of Carboxylate Based Rare-Earth Coordination Polymers
    R. Decadt, K. Van Hecke, D. Depla, K. Leus, D. Weinberger, I. Van Driessche, P. Van Der Voort, R. Van Deun
    Inorganic Chemistry (2012), DOI 10.1021/ic301544q

  3. Magnetron sputter deposition as visualized by Monte Carlo modeling
    D. Depla, W.P. Leroy
    Thin Solid films 520 (2012) 6337, DOI 10.1016/j.tsf.2012.06.032

  4. Adsorption of cobalt (II) 5,10,15,20-tetrakis(2-aminophenyl)-porphyrin onto copper substrates: characterization and impedance studies for corrosion inhibition
    K.S. Lokesh, M. De Keersmaecker, A. Elia, D. Depla, P. Dubruel, P.Vandenabeele, S. Van Vlierberghe, A. Adriaens
    Corrosion Science 62 (2012) 73, DOI 10.1016/j.corsci.2012.04.037

  5. Synthesis, characterization and sorption properties of NHâ‚‚-MIL-47
    K.Leus, S. Couck, M. Vandichel, G. Vanhaelewyn, Ying-Ya Liu, G. Marin, I. Van Driessche, D. Depla, M. Waroquier, V. Van Speybroeck, J.F.M. Denayer, P. Van Der Voort
    Physical Chemistry Chemical Physics 14 (2012) 15562, DOI 10.1039/C2CP42137B

  6. Sputter deposition of MgxAlyOz thin films in a dual magnetron device: a multi-species Monte Carlo model
    M. Yusupov, M. Saraiva, D. Depla, A. Bogaerts
    New Journal of Physics 14 (2012) 073043, DOI 10.1088/1367-2630/14/7/073043

  7. Thirty years of rotatable magnetrons
    R. De Gryse, J. Haemers, W.P. Leroy , D. Depla
    Thin Solid Films 520 (2012) 5833, DOI 10.1016/j.tsf.2012.04.065

  8. Composition-Crystallinity-Property relations in Mg-M-O films
    M. Saraiva, R. Persoons, D. Depla
    Journal of Applied physics 111 (2012) 103532, DOI 10.1063/1.4722173

  9. Texture and microstructure in co-sputtered Mg-M-O (M= Mg, Al, Cr, Ti, Zr and Y) films
    M. Saraiva, D. Depla
    Journal of Applied Physics 111 (2012) 104903, DOI 10.1063/1.4718431

  10. Influence of target–substrate distance and composition on the preferential orientation of yttria-stabilized zirconia thin films
    J. Lamas, W.P. Leroy, D. Depla
    Thin Solid Films 520 (2012) 4782–4785, DOI 10.1016/j.tsf.2011.10.179

  11. Modeling reactive magnetron sputtering: Fixing the parameter set
    K. Strijckmans, W.P. Leroy, R. De Gryse, D. Depla
    Surface and Coatings Technology 206 (2012) 3666-3675, DOI 10.1016/j.surfcoat.2012.03.019


  12. Deposition of thin films by sputtering cold isostatically pressed powder targets: A case study
    F. Boydens, W.P. Leroy, R. Persoons, D. Depla
    Physica Status Solidi A 209 (2012) 524-530, DOI 10.1002/pssa.201127490

2011:

  1. Smart textiles: an explorative study of the use of magnetron sputter deposition
    D. Depla, S. Segers, W.P. Leroy, T. Van Hove, M. Van Parys
    Textile Resarch Journal 81(2011) 1808-1817

  2. The influence of Cr and Y on the micro structural evolution of Mg-Cr-O and Mg-Y-O thin films
    N. Jehanathan, V. Georgieva, M. Saraiva, D. Depla, A. Bogaerts, G. Van Tendeloo
    Thin Solid Films 519 (2011) 5388, DOI 10.1016/j.tsf.2011.02.050

  3. Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system
    M. Yusupov, E. Bultinck, D. Depla, A. Bogaerts
    Applied Physics Letters 98 (2011) 131502, DOI 10.1063/1.3574365

  4. Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere
    W.P. Leroy, S. Konstantinidis, S. Mahieu, R. Snyders, D. Depla
    Journal of Physics D: Applied Physics 44 (2011) 115201, DOI 10.1088/0022-3727/44/11/115201

  5. Sputter deposited transition metal nitrides as back electrode for CIGS solar cells
    S. Mahieu, W.P. Leroy, K. Van Aeken, M. Wolter, J. Colaux, S. Lucas, G. Abadias, P. Matthys, D. Depla
    Solar Energy 85 (2011) 538, DOI 10.1016/j.solener.2010.12.021

  6. Behavior of electrons in a dual-magnetron sputter deposition system: a Monte Carlo model
    M. Yusupov, E. Bultinck, D. Depla, A. Bogaerts
    New Journal of Physics 13 (2011) 033018, DOI 10.1088/1367-2630/13/3/033018

  7. Extracting organic contaminants from water using the metal–organic framework CrIII(OH) {O2C–C6H4–CO2}
    M. Maes, S. Schouteden, L. Alaerts, D. Depla and D.E. De Vos
    Physical Chemistry Chemical Physics 13 (2011) 5587, DOI: 10.1039/C0CP01703

  8. Rotatable magnetron sputtering: downscaling for better understanding
    R. De Gryse, D. Depla, S. Mahieu and J. Haemers
    Materials Technology 26 (2011) 3, DOI 10.1179/175355511X12941605982109
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2010:

  1. Rotating cylindrical magnetron sputtering: Simulation of the reactive process
    D. Depla, X.Y. Li, S. Mahieu, K. Van Aeken, W.P. Leroy, J. Haemers, R. De Gryse, A. Bogaerts
    Journal of Applied Physics 107 (2010) 0113307, DOI 10.1063/1.3415550

  2. The origin of Bohm diffusion, investigated by a comparison of different modelling methods
    E. Bultinck, S. Mahieu, D. Depla, A. Bogaerts
    Journal of Physics D: Applied Physics 43 (2010) 292001, DOI 10.1088/0022-3727/43/29/292001

  3. An in-situ monitor to measure the momentum flux during physical vapour deposition
    S. Mahieu, D. Depla
    Surface and Coating Technology 204 (2010) 2085, DOI 10.1016/j.surfcoat.2009.08.033 

  4. Experimental determination and simulation of the angular distribution of the metal flux during magnetron sputter deposition
    M. Horkel, K. Van Aeken, C. Eisenmenger-Sittner, D. Depla, S. Mahieu, W.P. Leroy
    Journal of Physics D: Applied Physics 43 (2010) 075302, DOI 10.1088/0022-3727/43/7/075302

  5. Compositional effects on the growth of Mg(M)O
    M. Saraiva, V. Georgieva, S. Mahieu, K. Van Aeken, A. Bogaerts, D. Depla
    Journal of Applied Physics 107 (2010) 034902, DOI 10.1063/1.3284949

  6. Influence of the magnetic field configuration on the reactive sputter deposition of TiN
    F. Boydens, S. Mahieu, J. Haemers, D. Depla
    Physica Status Solidi A 207 (2010) 124, DOI 10.1002/pssa.200925203

  7. High power impulse magnetron sputtering using a rotating cylindrical magnetron
    W.P. Leroy, S. Mahieu, D. Depla, A.P. Ehiasarian
    Journal of Vacuum Science and Technology A 28 (2010) 108, DOI 10.1116/1.3271136
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2009:

  1. Modelling the flux of high energy negative ions during reactive magnetron sputtering.
    S. Mahieu, W.P. Leroy, K. Van Aeken, D. Depla
    Journal of Applied Physics 106 (2009) 093302

  2. Computer modeling of magnetron discharges
    A. Bogaerts, E. Bultinck, I. Kolev, L. Schwaederle, K Van Aeken, G. Buyle, D. Depla
    Journal of Physics D: Applied Physics 42 (2009) 194018

  3. Influence of the target composition on reactively sputtered titanium oxide films
    T. Kubart , J. Jensen, T. Nyberg, L. Liljeholm, D. Depla, S. Berg
    Vacuum 83 (2009) 1295

  4. Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering: The method and results
    W.P. Leroy, S. Mahieu, R. Persoons, D. Depla
    Thin Solid Films 518 (2009) 1527, DOI 10.1016/j.tsf.2009.07.190

  5. Influence of Al content on the properties of MgO grown by reactive magnetron sputtering
    M. Saraiva, H. Chen, W.P. Leroy, S. Mahieu, N. Jehanathan, O. Lebedev, V. Georgieva, R. Persoons, D. Depla
    Plasma Processes and Polymers 6 (2009) S751, DOI: 10.1002/ppap.200931809

  6. Method to Determine the Sticking Coefficient of O2 on Deposited Al During Reactive Magnetron Sputtering, Using Mass Spectrometry
    W.P. Leroy, S. Mahieu, R. Persoons, D. Depla
    Plasma Processes and Polymers 6 (2009) S342, DOI: 10.1002/ppap.200932401

  7. Particle-in-Cell/Monte Carlo Collisions Model for the Reactive Sputter Deposition of Nitride Layers
    E. Bultinck, S. Mahieu, D. Depla, A. Bogaerts
    Plasma Processes and Polymers 6 (2009) S784

  8. Magnetron sputter deposition: Linking discharge voltage with target properties
    D. Depla, S. Mahieu, R. De Gryse
    Thin Solid Films 517 (2009) 2825

  9. Sputter-deposited Mg–Al–O thin films: linking molecular dynamics simulations to experiments
    V. Georgieva, M. Saraiva, N. Jehanathan, O. Lebelev, D. Depla, A. Bogaerts
    Journal of Physics D: Applied Physics 42 (2009) 065107

  10. Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate
    S. Mahieu, D. Depla
    Journal of Physics D: Applied Physics 42 (2009) 053002

  11. Reactive sputter deposition of TiNx films, simulated with a particle-in-cell/Monte Carlo collisions model
    E. Bultinck, S. Mahieu, D. Depla, A. Bogaerts
    New Journal of Physics 11 (2009) 023039
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2008:
  1. Quantification of the ion and momentum fluxes towards the substrate during magnetron sputtering.
    S. Mahieu, K. Van Aeken, D. Depla
    Journal of Applied Physics 104 (2008) 113301

  2. FEATURED ARTICLE FROM IOP :
    The metal flux from a rotating cylindrical magnetron : a Monte Carlo simulation
    K. Van Aeken, S. Mahieu, D. Depla
    Journal of Physics D.: Applied Physics 41 (2008) 205307

  3. High rate reactive magnetron sputter deposition of titanium oxide
    T. Kubart, D. Depla, D. Martin, T. Nyberg, S. Berg
    Applied Physics Letters 92 (2008) 221501

  4. Cobalt thin films on gold: A new reference material for the quantification of cobalt phthalocyanine and cobalt porphyrin modified gold electrodes with synchrotron radiation micro-XRF
    A. Adriaens, D. Bogaert, K. De Wael, H. Buschop, T. Schoonjans, B. Vekemans, D. Depla, L. Vincze
    Spectrochimica Acta Part B 63 (2008) 988–991

  5. Noble gas retention in the target during rotatable cylindrical magnetron sputtering
    S. Mahieu, W.P. Leroy, D. Depla, S. Schreiber, W. Möller
    Applied Physics Letters 93 (2008) 061501

  6. Dependence of the sticking coefficient of the sputtered atoms on the target-substrate distance
    S. Mahieu, K. Van Aeken, D. Depla, D. Smeets, A. Van Tomme
    Journal of Physics D.: Applied Physics 41 (2008) 152005

  7. Determination of the effective electron emission yields of compound materials
    D. Depla, X.Y. Li, S. Mahieu, R. De Gryse
    Journal of Physics D.: Applied Physics 41 (2008) 202003

  8. Characterization of the hardness and the substrate fluxes during reactive magnetron sputtering of TiN
    S. Mahieu, D. Depla, R. De Gryse
    Surface and Coatings Technology 202 (2008) 2314

  9. The importance of an external circuit in a particle-in-cell/Monte Carlo collisions model for a direct current planar magnetron
    E. Bultinck, I. Kolev, A. Bogaerts, D. Depla
    Journal of Applied Physics 103 (2008) 013309 

  10. Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering
    X.Y. Li, D. Depla, W.P. Leroy, J. Haemers, R. De Gryse
    Journal of Physics D.: Applied Physics 41 (2008) 035203

  11. Observation of hysteresis in a non-reactive magnetron discharge
    J. Musschoot, D. Depla, J. Haemers, R.  De Gryse
    Plasma Sources Science and Technology 17 (2008) 015010

  12. Investigation of the systaining mechanism of dc magnetron discharges and consequences for I-V charactistics
    J. Musschoot, D. Depla, G. Buyle, J. Haemers, R. De Gryse
    Journal of Physics D : Applied Physics 41 (2008) 015209

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2007:
  1. Magnetron Sputter Deposition for Catalyst Synthesis
    H. Poelman, K. Eufinger, D. Depla, D. Poelman, R. De Gryse, B.F. Sels, G.B. Marin
    Applied Catalysis A : General 325 (2007) 213

  2. Towards a more complete model for reactive magnetron sputtering.
    D. Depla, S. Heirwegh, S. Mahieu, R. De Gryse
    Journal of Physics D : Applied Physics 40 (2007) 1957

  3. Correlation between electron and negative O- ion emission during reactive sputtering of oxides
    S. Mahieu, D. Depla
    Applied Physics Letters  90 (2007) 121117

  4. Influence of the target composition on the discharge voltage during magnetron sputtering
    D. Depla, H. Tomaszewski, G. Buyle, R. De Gryse
    Surface and Coatings Technology 201 (2006) 848

  5. Physico-chemical chracterization of nanofiltration membrames
    K. Boussu, J. De Baerdemaeker, C. Dauwe, D. Depla, et al.
    Chemical Physics Physical Chemistry 8 (2007) 370

  6. Hydrogen-plasma-induced plate-like cavity clusters in single-crystalline germanium
    J. Lauwaert, M.L. David, M.F. Beaufort, D. Depla, et al.
    Materials Science in Semiconductor Processing 9 (2006) 571-575 

  7. Understanding the discharge voltage behaviour during reactive sputtering of oxides
    D. Depla, S. Heirwegh, S. Mahieu, J. Haemers, R. De Gryse
    Journal of Applied Physics 101 (1) (2007) 013301

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2006:
  1. Chemical and morphological changes of historical lead objects as a result of the use of electrolytic reduction as a stabilization treatment
    Schotte B, Adriaens A, Dhooghe F, Depla D, et al.
    Analytical Chemistry 78 (2006) 8319

  2. Biaxial alignment in sputter deposited thin films
    Mahieu S, Ghekiere P, Depla D, De Gryse R
    Thin Solid Films 515 (4) (2006) 1229

  3. Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation
    Musschoot J, Depla D, Buyle G, Haemers J, De Gryse R
    Journal of Physics D : Applied Physics 39 (2006) 3989

  4. Effect of nitridation on the electronic environment of vanadium in VAlO(N) powder catalysts used for the ammoxidation of propane
    Silversmit G, Poelman H, De Gryse R, Bras W, Nikitenko S, Florea M, Grange P, Delsarte S
    Catalysis Today 18 (2006) 344

  5. Mechanism of biaxial alignment in thin films deposited by magnetron sputtering
    Mahieu S, Buyle G, Ghekiere P, Heirwegh S, De Gryse R, Depla D
    Thin Solid Films 515 (2006) 416

  6. The effect of argon pressure on the structural and photocatalytic characteristics of TiO2 thin films deposited by d.c. magnetron sputtering
    Eufinger K, Janssen EN, Poelman H, Poelman D, De Gryse R, Marin GB
    Thin Solid Films 515 (2006) 425

  7. Discharge voltage measurements during reactive sputtering of oxides
    Depla D, Haemers J, De Gryse R
    Thin Solid Films 515 (2006) 468

  8. Structure evolution of the biaxial alignment in sputter-deposited MgO and Cr
    Ghekiere P, Mahieu S, De Gryse R, Depla D
    Thin Solid Films 515 (2006) 485

  9. The d.c. magnetron sputtering behavior of TiO2-x targets with added Fe2O3 or Nd2O3
    Eufinger K, Tomaszewski H, Depla D, Poelman H, Poelman D, De Gryse R
    Thin Solid Films 515 (2006) 683

  10. An XPS study on the surface reduction of V2O5(001) induced by Ar+ ion bombardment
    Silversmit G, Depla D, Poelman H, Marin GB, De Gryse R
    Surface Science 600 (2006) 3512

  11. A comparative XPS and UPS study of VOx layers on mineral TiO2(001)-anatase supports
    Silversmit G, Poelman H, Depla D, Barrett N, Marin GB, De Gryse R
    Surface and Interface Analysis 38 (2006) 1257

  12. Plasma emission redistribution in a single cycle of a pulsed dc magnetron
    Zhu W, Buyle G, Lopez J, Shanmugmurthy S, Belkind A, Becker K, De Gryse R
    New Journal of Physics 8 (2006)

  13. Hysteresis behavior during reactive magnetron sputtering of A(2)O(3) using a rotating cylindrical magnetron
    Depla D, Haemers J, Buyle G, De Gryse R
    Journal of Vacuum Science and Technology A 24 (2006) 934

  14. Mechanism of in-plane alignment in magnetron sputtered biaxially aligned yttria-stabilized zirconia
    Mahieu S, Ghekiere P, Depla D, De Gryse R, Lebedev OI, Van Tendeloo G
    Journal of Crystal Growth 290 (2006) 272

  15. Discharge voltage measurements during magnetron sputtering
    Depla D, Buyle G, Haemers J, De Gryse R
    Surface and Coatings Technology 200 (2006) 4329

  16. An in-situ reduction/oxidation XAS study on the EL10V8 VOx/TiO2(Anatase) powder catalyst
    Silversmit G, Poelman H, Sack I, Buyle G, Marin GB, De Gryse R
    Catalysis Letters 107 (2006) 61

  17. Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering
    Mahieu S, Ghekiere P, De Winter G, De Gryse R, Depla D, Van Tendeloo G, Lebedev OI
    Surface and Coatings Technology 200 (2006) 2764

  18. Monte Carlo simulation of the transport of atoms in DC magnetron sputtering
    Mahieu S, Buyle G, Depla D, Heirwegh S, Ghekiere P, De Gryse R
    Nuclear Instruments & Methods in Physics Research Section B - Beam interactions with Materials and Atoms 243 (2006) 313

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2005:
 
  1. Scanning electron microscopy study of the growth mechanism of biaxially aligned magnesium oxide layers grown by unbalanced magnetron sputtering
    Ghekiere P, Mahieu S, De Winter G, De Gryse R, Depla D
    Thin Solid Films 493 (2005) 129

  2. Growth mechanism of biaxially aligned magnesium oxide deposited by unbalanced magnetron sputtering
    Ghekiere P, Mahieu S, De Winter G, De Gryse R, Depla D, Lebedev OI
    Texture and Anisotropy of Polycrystals II: Solid State Phenomena 105 (2005) 433

  3. Biaxially aligned yttria stabilized zirconia and titanium nitride layers deposited by unbalanced magnetron sputtering.
    Mahieu S, Ghekiere P, De Winter G, De Gryse R, Depla D, Lebedev OI
    Texture and Anisotropy of Polycrystals II: Solid State Phenomena 105 (2005) 447

  4. Influence of the Ar/O-2 ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering
    Mahieu S, Ghekiere P, De Winter G, Depla D, De Gryse R, Lebedev OI, Van Tendeloo G
    Thin Solid Films 484 (2005) 18

  5. A fully oxidized V2O5/TiO2(001)-anatase system studied with in situ synchrotron photoelectron spectroscopy
    Silversmit G, Poelman H, Depla D, Barrett N, Marin GB, De Gryse R
    Surface Science 584 (2005) 179

  6. The effect of composition and oxygen pressure on the superconducting properties of NdBa2Cu3O7-x thin films deposited by rotatable magnetron sputtering
    De Roeck I, De Winter G, De Gryse R, Denul J, Segers A, Hollmann E, Wordenweber R
    IEEE Transactions on Applied Superconductivity 15 (2005) 3070

  7. UPS study of the thermal reduction of fully oxidized V2O5/TiO2(001)-anatase model catalysts
    Silversmit G, Poelman H, Depla D, Poelman D, Barrett N, Marin GB, De Gryse R
    Journal of Electron Spectroscopy and Related Phenomena 144 (2005) 377

  8. Mechanism of preferential orientation in sputter deposited titanium nitride and yttria-stabilized zirconia layers
    Mahieu S, Ghekiere P, De Winter G, Heirwegh S, Depla D, De Gryse R, Lebedev OI, Van Tendeloo G
    Journal of Crystal Growth 279 (2005) 100

  9. The structure of supported and unsupported vanadium oxide under calcination reduction and oxidation determined with XAS
    Silversmit G, van Bokhoven JA, Poelman H, van der Eerden AMJ, Marin GB, Reyniers MF, De Gryse R
    Applied Catalysis A - General 285 (2005) 151

  10. DC magnetron sputtered vanadia catalysts for oxidation processes.
    Olea M, Sack I, Balcaen V, Marin GB, Poelman H, Eufinger K, de Gryse R, Paul JS, Sels BF, Jacobs PA
    Abstracts of Papers of the American Chemical Society 228 (2004) U496

  11. Study of the deposition and Raman and XPS characterization of a metal ion tetrasulphonated phthalocyanine layer at gold surfaces.
    De Wael K, Westbroek P, Bultinck P, Depla D, Vandenabeele P, Adriaens A, Temmerman E
    Electrochemistry Communications 7 (2005) 87


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2004:
 
  1. Mechanisms of target poisoning during magnetron sputtering as investigated by real-time in situ analysis and collisional computer simulation
    Guttler D, Abendroth B, Grotzschel R, Moller W, Depla D
    Applied Physics Letters 85 (2004) 6134

  2. Influence of the deposition parameters on the biaxial alignment of MgO grown by unbalanced magnetron sputtering
    Ghekiere P, Mahieu S, De Winter G, De Gryse R, Depla D
    Journal of Crystal Growth 271 (2004) 462

  3. A model for the development of biaxial alignment in yttria stabilized zirconia layers deposited by unbalanced magnetron sputtering
    Mahieu S, De Winter G, Depla D, De Gryse R, Denul J
    Surface and Coatings Technology 187 (2004) 122

  4. Influence of magnetron deposition parameters on the stoichiometry of sputtered V2O5 films
    Silversmit G, Poelman H, De Gryse R
    Surface and Interface Analysis 36 (2004) 1163

  5. Effect of the oxyzen deficiency of ceramic TiO2-x targets on the deposition of TiO2 thin films by DC magnetron sputtering
    Poelman H, Tomaszewski H, Poelman D, Depla D, De Gryse R
    Surface and Interface Analysis 36 (2004) 1167

  6. Modeling of the target surface modification by reactive ion implantation during magnetron sputtering
    Depla D, Chen ZY, Bogaerts A, Ignatova V, De Gryse R, Gijbels R
    Journal of Vacuum Science and Technology A 22 (2004) 1524

  7. Determination of the V2p XPS binding energies for different vanadium oxidation states (V5+ to V0+)
    Silversmit G, Depla D, Poelman H, Marin GB, De Gryse R
    Journal of Electron Spectroscopy and Related Phenomena 135 (2004) 167

  8. TAP studies on the reoxidation of some partially reduced vanadia-based catalysts
    Sack I, Olea M, Poelman H, Eufinger K, De Gryse R, Marin GB
    Catalysis Today 91-92 (2004) 149

  9. Calculation of the effective gas interaction probabilities of the secondary electrons in a dc magnetron discharge
    Buyle G, Depla D, Eufinger K, De Gryse R
    Journal of Physics D : Applied Physics 37 (2004) 1639

  10. Simplified model for the DC planar magnetron discharge
    Buyle G, Depla D, Eufinger K, Haemers J, De Bosscher W, De Gryse R
    Vacuum 74 (2004) 353

  11. Target poisoning during reactive magnetron sputtering: Part I: the influence of ion implantation
    Depla D, De Gryse R
    Surface and Coatings Technology 183 (2004) 184

  12. Target poisoning during reactive magnetron sputtering: Part II: the influence of chemisorption and gettering
    Depla D, De Gryse R
    Surface and Coatings Technology 183 (2004) 190

  13. Target poisoning during reactive magnetron sputtering: Part III: the prediction of the critical reactive gas mole fraction
    Depla D, De Gryse R
    Surface and Coatings Technology 183 (2004) 196

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2003:
 
  1. A heterogeneous Ru-hydroxyapatite catalyst for mild racemization of alcohols
    Wuyts S, De Vos DE, Verpoort F, Depla D, De Gryse R, Jacobs PA
    Journal of Catalysis 219 (2003) 417

  2. Simplified model for calculating the pressure dependence of a direct current planar magnetron discharge
    Buyle G, Depla D, Eufinger K, Haemers J, De Gryse R, De Bosscher W
    Journal of Vacuum Science and Technology A 21 (2003) 1218

  3. Unbalanced magnetron sputter deposition of biaxially aligned yttria stabilized zirconia and indium tin oxide thin films
    De Winter G, Mahieu S, De Roeck I, De Gryse R, Denul J
    IEEE Transactions on Applied Superconductivity 13 (2003) 2567

  4. Dynamic Monte Carlo simulation for reactive sputtering of aluminium
    Chen ZY, Bogaerts A, Depla D, Ignatova V
    Nuclear Instruments & Methods in Physics Research Section B - Beam interactions with Materials and Atoms 207 (2003) 415

  5. Recapture of secondary electrons by the target in a DC planar magnetron discharge
    Buyle G, De Bosscher W, Depla D, Eufinger K, Haemers J, De Gryse R
    Vacuum 70 (2003) 29

  6. Target voltage measurements during DC sputtering of silver in a nitrogen/argon plasma
    Depla D, De Gryse R
    Vacuum 69 (2003) 529


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2002:
 
  1. TiO2 films prepared by DC magnetron sputtering from ceramic targets
    Tomaszewski H, Poelman H, Depla D, Poelman D, De Gryse R, Fiermans L, Reyniers MF, Heynderickx G, Marin GB
    VACUUM 68 (2002) 31-38
  2. Importance of recapture of secondary electrons in cylindrical and planar magnetron discharges
    Buyle G, Depla D, Eufinger K, Haemers J, de Gryse R, de Bosscher W
    CZECHOSLOVAK JOURNAL OF PHYSICS 52 (2002) 615-623
  3. Influence of deposition parameters on the biaxial alignment of YSZ buffer layers using an unbalanced magnetron
    De Winter G, De Roeck I, Van Paemel R, De Gryse R, Denul J
    PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS 372 (2002) 719-722
  4. Rotatable magnetron sputtering of YBa2Cu3O7-x thin films on single crystal substrates
    De Roeck I, De Winter G, Van Paemel R, De Gryse R, Denul J, Van Driessche I, Bruneel E, Hoste S, Georgiopoulos E, Andreouli C, Tsetsekou A
    PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS 372 (2002) 1067-1070
  5. Comparison of plasma sprayed and flame sprayed YBa2Cu3O7-x targets for rotatable magnetron sputtering
    Van Driessche I, Georgiopoulos E, Denul J, Tsetsekou A, Andreouli C, De Roeck I, De Winter G, De Gryse R, Bruneel E, Hoste S
    PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS 372 (2002) 1221-1224
  6. V2O5 thin films deposited by means of d.c. magnetron sputtering from ceramic V2O3 targets
    Poelman H, Tomaszewski H, Poelman D, Fiermans L, De Gryse R, Reyniers MF, Marin GB
    SURFACE AND INTERFACE ANALYSIS 34 (2002) 724-727
  7. Target voltage behaviour during DC sputtering of silicon in an argon/nitrogen mixture
    Depla D, Colpaert A, Eufinger K, Segers A, Haemers J, De Gryse R
    VACUUM 66 (2002) 9-17
  8. Cross section for removing chemisorbed oxygen from an aluminum target by sputtering
    Depla D, De Gryse R
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 20 (2002) 521-525
  9. Target surface condition during reactive glow discharge sputtering of copper
    Depla D, Haemers J, De Gryse R
    PLASMA SOURCES SCIENCE & TECHNOLOGY 11 (2002) 91-96

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2001:
 
  1. Influence of oxygen addition on the target voltage during reactive sputtering of aluminium
    Depla D, De Gryse R
    PLASMA SOURCES SCIENCE & TECHNOLOGY 10 (2001) 547-555
  2. Electronic and optical characterisation of TiO2 films deposited from ceramic targets
    Poelman H, Poelman D, Depla D, Tomaszewski H, Fiermans L, De Gryse R
    SURFACE SCIENCE 482 (2001) 940-945
  3. An X-ray photoelectron diffraction study of a TiO2(001) anatase single crystal mineral
    Silversmit G, Poelman H, Fiermans L, De Gryse R
    SOLID STATE COMMUNICATIONS 119 (2001) 101-104
  4. Deposition of biaxially aligned yttria stabilized zirconia layers on metal tape by modified magnetron sputtering
    De Winter G, Denul J, De Gryse R
    IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY 11 (2001) 2893-2896
  5. YBa2CU3O7-x sputter deposition from rotatable targets: a scalable approach for YBa2CU3O7-x coated conductors
    Denul J, De Winter G, De Gryse R
    IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY 11 (2001) 2909-2912
  6. Ion assisted deposition of biaxially aligned YSZ layers on metal tape
    Denul J, De Winter G, De Gryse R
    PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS 351 (2001) 45-48

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1997-2000: 
 
  1. Rotating cathode magnetrons- Advantages and disadvantages
    De Gryse R
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS 55 (2000) 248
  2. Pd segregation to the surface of bimetallic Pt-Pd particles supported on H-beta zeolite evidenced with X-ray photoelectron spectroscopy and argon cation bombardment
    Fiermans L, De Gryse R, De Doncker G, Jacobs PA, Martens JA
    JOURNAL OF CATALYSIS 193 (2000) 108-114
  3. Nondestructive characterization of thin silicides using x-ray reflectivity
    Detavernier C, De Gryse R, Van Meirhaeghe RL, Cardon F, Ru GP, Qu XP, Li BZ, Donaton RA, Maex K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 18 (2000) 470-476
  4. Chemical instability of the target surface during DC-magnetron sputtering of ITO-coatings
    Lippens P, Segers A, Haemers J, De Gryse R
    THIN SOLID FILMS 317 (1998) 405-408
  5. Yttria-stabilised zirconia thin films grown by reactive rf magnetron sputtering (vol 287 pg 104 1996)
    Tomaszewski H, Haemers J, Denul J, DeRoo N, DeGryse R
    THIN SOLID FILMS 306 (1997) 178-178
  6. Yttria-stabilized zirconia thin films grown by rf magnetron sputtering from an oxide target (vol 293 pg 67 1997)
    Tomaszewski H, Haemers J, DeRoo N, Denul J, DeGryse R
    THIN SOLID FILMS 305 (1997) 358-358
  7. Yttria-stabilized zirconia thin films grown by rf magnetron sputtering from an oxide target
    Tomaszewski H, Haemers J, DeRoo N, Denul J, DeGryse R
    THIN SOLID FILMS 293 (1997) 67-74
  8. Modelling of reactive spray drying of precursors for high T-c superconducting ceramics
    Depla D, Mouton R, Hoste S
    JOURNAL OF THE EUROPEAN CERAMIC SOCIETY 17 (1997) 153-159
  9. Crystallization of yttria under hydrothermal conditions
    Tomaszewski H, Weglarz H, DeGryse R
    JOURNAL OF THE EUROPEAN CERAMIC SOCIETY 17 (1997) 403-406
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