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Eighteenth International Conference on Reactive Sputter Deposition 2019

  Braunschweig, Germany - 5 - 6 Dec 2019

Short course


Do you want to learn more about reactive sputter deposition ?

On Wednesday December 5th 2018, one day before the opening of RSD2018, a short course on the fundamental aspects of reactive sputter deposition will be organised.

Registration fee

Students : €150
Other participants : €300

Registration fee includes lunch, copies of the slides and a personal copy of the handbook “Magnetrons, reactive gases and sputtering

The short course will only be organized when sufficient persons subscribe. The number of participants is limited to 20 persons. Just indicate your interest to join the short course when you register for the symposium. If the short course take place, you'll be informed in due time to register for the short course.

Course objectives

  • Understand the fundamental processes driving (reactive) magnetron sputtering
  • Develop strategies for dedicated experiments to unravel the complexity of reactive
    magnetron sputtering
  • To get a good overview of the current literature and modelling techniques.

Course description

Reactive magnetron sputter deposition is a mature technique often used in laboratories and at industrial level to grow compound thin films. The growth of these films is defined by the deposition conditions, and therefore a good knowledge of the deposition process is essential to tune the growth and as such the film properties.
After a short introduction on the physics of sputtering, the magnetron discharge and the transport of sputtered atoms through the gas phase, the course starts with a few definitions regarding reactive
sputtering to show that the processes driving this technique are general applicable. This introduction assist the attendee to the next step : the description of the most common experiment during reactive
magnetron sputtering, the hysteresis experiment. The simplicity of this experiment fools initially the scientist because it hides a complex interplay between different processes at the target, in the plasma and, at the substrate defines the actual outcome of the experiment. During the course the details of this experiment are analyzed, and modelling is used to introduce the attendee in the different processes. In this way, the attendee will gain knowledge in a welth of important process controlling thin film growth such as reactive ion implantation, chemisorption, preferential sputtering, deposition profile, discharge voltage behaviour. A good knowledge of these processes will arm the attendee to analyze and to control the reactive sputtering process.


Hand on simulations

To get a better understanding of some of the discussed principles, the course includes the usage of simulation packages (for example SIMTRA, RSD2013).


Prof. D. Depla : theory of reactive sputtering

Dr. K. Strijckmans : RSD2013 : the tool to simulate reactive magnetron sputtering, SIMTRA : model your own deposition profile


The short course will be organized at Soleras Advanced Coatings. More details on this company can be found here

We will organize transport from UGent to Soleras Advanced Coatings. The transport is included in the registration fee. After the short course, it is possible to visit the company Solares Advanced Coatings. Soleras Advanced Coatings is a leading global provider of sputter targets and equipment used in the deposition of thin film coatings. Their products and services are uniquely developed to drive improved productivity and performance, particularly for large area coating applications using rotary sputtering. The company visit will take place between 4pm and 7pm. After the tour the company offers a drink. Transport from Gent (and back) will be organized. Short course attendees do not need to make this reservation as the short course will take place at Solares Advanced Coatings.