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a research group of the department of Solid State Sciences, Ghent University

Reactive Sputtering: RSD2013

This program models the reactive sputtering process in dc mode. The program has been developed by Koen Strijckmans. This model is based on the previous models RSD2007 [Journal of Physics : Applied Physics D, 40 (2007) 1957–1965] and RSD2009 [Journal of Applied Physics, 107 (2010) 113307] by Diederik Depla. In the RSD2013 software two solution methods are available: a time dependent and a steady state solution. Both target and substrate can be described in a spatial resolved way by defining appropriate deposition (SIMTRA) and current profiles. The substrate condition is described in a similar way as by the original model developed by S. Berg [Thin Solid Films 476 (2005) 215]. However, to describe the target poisoning more reaction paths are taken into account. The first path is the same as in the Berg model, i.e. chemisorption of reactive gas molecules on the target. A second path is the implantation of reactive ions, formed in the plasma, in the target. Finally, as last path, the chemisorbed species can be knock-on implanted into the target. These implanted reactive species react with the target material. The effect of redeposition, the deposition of sputtered material back on the target, is also accounted for.

Please refer to the paper K Strijckmans and D Depla, J. Phys. D: Appl. Phys. (2014) 47 235302 when using results calculated with this program.

Download RSD2013 version 1

Download the RSD2013 manual (applicable to version 1)

Download RSD2013 version 2 

Release notes version 2

Simulation of the metal flux: SIMTRA

This binary collision Monte Carlo program allows the user to simulate the transport of sputtered particles through the gas phase flux during sputtering. The code has been orginally developped by Koen Van Aeken. The new graphical interface has been constructed by Francis Boydens. Suggestions for improvement were made by the team (active in the period of 31/08 to 30/09/2015).

The user is able to define the simulated configuration, and thus to mimic his own experimental setup. Not only the deposition profile and rate but also the properties of the metallic flux (energy, direction,...) are an output of the code.

The current version is 2.1.1. Feel free to report any bugs.

When using this code, please use the following reference: 

The metal flux from a rotating cylindrical magnetron : a Monte Carlo simulation
K. Van Aeken, S. Mahieu, D. Depla
Journal of Physics D.: Applied Physics 41 (2008) 20530, DOI 10.1088/0022-3727/41/20/205307 

Download SIMTRA

Download SIMTRA manual

Known issues: check releasenotes.txt (last updated: Feb. 18, 2016 - 16:00 CEST)

For some examples on the use of SIMTRA, see:

Magnetron sputter deposition as visualized by Monte Carlo modeling

D. Depla, W.P. Leroy
Thin Solid films 520 (2012) 6337, DOI 10.1016/j.tsf.2012.06.032