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International Symposium on Reactive Sputter Deposition 2000

  Ghent, Belgium - 2000

The year 2000 was filled with joy on the birth of the new International Symposium on Reactive Sputter Deposition! It was for the first time organised in Ghent, Belgium by the research group of prof. Roger De Gryse.

A sample from the speakers list from 2000:

  • S. Berg (University of Uppsala, Sweden)
    Understanding the basic mechanisms of reactive sputtering processes

  • A. Belkind (Thin Films, North Plainfield, NJ, USA)
    Reactive sputtering of dielectrics

  • M. Hecq (Université de l'Etat à Mons, Belgium)
    Plasma diagnostics for reactive sputtering processes

  • D.Depla (University of Ghent, Belgium)
    Target surface modifications during reactive magnetron sputtering

  • A. Van Tomme (KULeuven, Belgium)
    Trends in sputter yield data in the film deposition regime

  • B. Thijsse (Delft University of Technology, The Netherlands)
    Ion-solid interactions and defects : some sub-keV experiments and simulations

  • W. Rabalais (University of Houston, USA)
    Interactions of hyperthermal particles with surfaces of materials

  • K. Ellmer (Hahn-Meitner-Institut, Berlin, Germany)
    Growth of magnetron sputtered ITO films. An in situ study by Energy Dispersive X-ray diffraction (EDXRD)

  • W. Zyrnicki (Wroclaw University of Technology, Poland)
    On the applicability of optical emission spectroscopy in studying sputtering processes.

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