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International Symposium on Reactive Sputter Deposition 2006

  Ghent, Belgium - 30 Nov & 1 Dec 2006

The International Symposium on Reactive Sputter Deposition 2006 was a co-organisation of the Belgian and the Dutch Vacuum Society and took place in Ghent (BE) on 30 November and 1 December 2006.

Sessions and invited speakers were:

  • Fundamental processes during magnetron sputtering
    W. Möller (Rossendorf, Germany)
    P.Zeijlmans van Emmichoven (University of Utrecht,The Netherlands)
  • Plasma diagnostics
    A. Belkind (Stevens Institute of Technology, USA)
    P. Kelly (Manchester, Metropolitan University, GB)
  • The growth of thin films
    C. Eisenmenger-Sittner (TUWien, Austria)
    P. Ghekiere (Ghent University, Belgium)
  • Industrial applications of (reactive) magnetron sputter deposition
    M. Geisler (Leybold Optics, Germany)
    J. Struempfel (Von Ardenne, Germany)
The Organising committee:

  • R. De Gryse, Ghent University, Belgium
  • D. Depla, Ghent University, Belgium
  • G.C.A.M. Janssen, Technical University of Delft, Netherlands
  • A. Kuiper, Philips Research Eindhoven, Netherlands

The program of the conference can be found here.

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